Method of fabricating thin layers from high-temperature oxide superconductors
摘要
A method and apparatus for producing thin superconductor film of high temperature oxide type ceramic superconductors by cathodic sputtering and in which the highest possible oxygen partial pressure is utilized in the space between the cathode and the substrate. Ionizing radiation can be introduced into the space as well.
申请公布号
US4965248(A)
申请公布日期
1990.10.23
申请号
US19890310698
申请日期
1989.02.13
申请人
KERNFORSCHUNGSANLAGE JULICH GESELLSCHAFT MIT BESCHRANKTER HAFTUNG