发明名称 Electron beam apparatus and image forming apparatus
摘要 <p>An electron beam apparatus comprises an electron source having an electron-emitting device, an electrode for controlling an electron beam emitted from the electron source, a target to be irradiated with an electron beam emitted from the electron source and a spacer (20) arranged between the electron source and the electrode. The spacer (20) has a semiconductor film (20b) on the surface thereof that is electrically connected to said electron source and said electrode. &lt;MATH&gt;</p>
申请公布号 EP0690472(A1) 申请公布日期 1996.01.03
申请号 EP19950304514 申请日期 1995.06.27
申请人 CANON KABUSHIKI KAISHA 发明人 MITSUTAKE, HIDEAKI, C/O CANON K.K.;KAWATE, SHINICHI, C/O CANON K.K.;NAKAMURA, NAOTO, C/O CANON K.K.;SANO, YOSHIHISA, C/O CANON K.K.
分类号 H01J5/03;H01J9/18;H01J9/24;H01J29/02;H01J29/86;H01J29/87;H01J31/12;(IPC1-7):H01J31/12;H01J29/82 主分类号 H01J5/03
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