发明名称 |
Electron beam apparatus and image forming apparatus |
摘要 |
<p>An electron beam apparatus comprises an electron source having an electron-emitting device, an electrode for controlling an electron beam emitted from the electron source, a target to be irradiated with an electron beam emitted from the electron source and a spacer (20) arranged between the electron source and the electrode. The spacer (20) has a semiconductor film (20b) on the surface thereof that is electrically connected to said electron source and said electrode. <MATH></p> |
申请公布号 |
EP0690472(A1) |
申请公布日期 |
1996.01.03 |
申请号 |
EP19950304514 |
申请日期 |
1995.06.27 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
MITSUTAKE, HIDEAKI, C/O CANON K.K.;KAWATE, SHINICHI, C/O CANON K.K.;NAKAMURA, NAOTO, C/O CANON K.K.;SANO, YOSHIHISA, C/O CANON K.K. |
分类号 |
H01J5/03;H01J9/18;H01J9/24;H01J29/02;H01J29/86;H01J29/87;H01J31/12;(IPC1-7):H01J31/12;H01J29/82 |
主分类号 |
H01J5/03 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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