| 摘要 |
<p>This invention discloses a lithographic plate comprising on a roughened substrate a substantially conformal radiation-sensitive layer. The radiation-sensitive layer can be a photo hardenable or photo solubilizable layer, or can be a laser ablatble layer. The radiation-sensitive layer is substantially conformally coated on the roughened substrate surface in a way so that the surface of the radiation-sensitive layer has peaks and valleys substantially corresponding to the major peaks and valleys of the substrate microscopic surface. The lithographic plate of such a configuration can provide no or low tackiness and excellent block resistance, while allowing excellent press durability. For on-press developable lithographic plate, such a plate configuration also allows excellent on-press developability.</p> |
