发明名称 HIGH TEMPERATURE HIGH PRESSURE SUBMERGED OXIDATION DECOMPOSITION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a high temperature high pressure submerged oxidation decomposition device in which even solid waste can be charged or discharged to or from its reaction vessel while keeping the temperature and pressure in the reaction vessel constant. SOLUTION: The high temperature high pressure submerged oxidation decomposition device 31 is provided with a slurry pump 37 for forcibly sending slurry containing organic waste and water at a high pressure, an oxidizing agent generator 43 for supplying an oxidizing agent to the slurry, a heater 49 for heating the slurry, the high temperature high pressure reaction vessel 45 for oxidation-decomposing the slurry in the high temperature-high pressure state and a gas/liquid separator 55 for gas/liquid separation of a material decomposition-treated in the high temperature high pressure reaction vessel 45. A loading-side reserve chamber 65 is connected to the upper part of the high temperature high pressure reaction vessel 45 through a 2nd air lock valve, a 1st air lock valve 67 is connected to the upper part of the loading-side reserve chamber 65, a discharge side reserve chamber 75 is connected to the lower part of the high temperature high pressure reaction vessel 45 through a 3rd air lock valve 73, and a 4th air lock valve 77 is connected to the lower part of the discharge side reserve chamber 75.
申请公布号 JP2002028613(A) 申请公布日期 2002.01.29
申请号 JP20000218556 申请日期 2000.07.19
申请人 TOKYOKOKI SEIZOSHO LTD 发明人 NAGAYAMA HARUO
分类号 B09B3/00;B01J3/00;B01J3/02;C02F11/06;(IPC1-7):B09B3/00 主分类号 B09B3/00
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