发明名称 |
Conformal disk holder for CMP pad conditioner |
摘要 |
A conformal disk holder for holding a rotating disk against a surface of a polishing pad is described. The conformal disk holder can be used for any polishing apparatus, but is particularly suited for use in a CMP pad conditioning disk. The conformal disk holder is constructed by a cover member, a flexural plate member and a base member. The flexural plate member has a center protrusion with a downwardly facing convex surface for intimately engaging an upwardly facing concave surface on a center protrusion of the base member. The intimate engagement between the convex surface and the concave surface allows at least a 5° tilt of the base member from a horizontal plane, and preferably allows a tilt between about 5° and about 30°.
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申请公布号 |
US6394886(B1) |
申请公布日期 |
2002.05.28 |
申请号 |
US20010975539 |
申请日期 |
2001.10.10 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD |
发明人 |
CHEN WEN-TEN;LIANG YAO-HSIANG;PENG CHIH-I;CHANG YU-CHIA |
分类号 |
B24B37/04;B24B53/007;B24B53/12;(IPC1-7):B24B47/02 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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