发明名称 Vorrichtung und Verahren zur elektrochemischen Beschichtung
摘要 The invention relates to a device and method, with which it is possible to electrochemically deposit thin layers with a nearly homogeneous layer thickness on large-surface substrates having relatively high resistances. These thin layers are, for example, metal layers, metal oxide layers or semiconductor layers as well as layers consisting of conductive polymers that, for example, are deposited on transparent electrodes or semiconductor substrates. The counter-electrode for the substrate to be coated is divided into several electrode segments and voltages that differ from one another can be applied between each individual electrode segment and the substrate to be coated. This results in achieving a good homogeneity of the deposited thin layers with respect to thickness and physical properties.
申请公布号 DE10100297(A1) 申请公布日期 2002.07.18
申请号 DE20011000297 申请日期 2001.01.04
申请人 GESIMAT GMBH 发明人 KRAFT, ALEXANDER;HECKNER, KARL HEINZ
分类号 C25D17/12;C25D21/12;(IPC1-7):C25D17/12;C25D5/00;C25D7/12 主分类号 C25D17/12
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