发明名称 CO-FINISHING SURFACES
摘要 A method for co-finishing surfaces bonds a first structure formed of a first material and having a first surface in an aperture defined in a second structure formed of a second material and having a second surface such that there is an offset between the first surface and the second surface. The first surface and the second surface are co-lapped to reduce the offset. The first surface and second surface are co-polished to further reduce the offset. The first surface and second surfaces may then be flush. Edges of the first surface may be chamfered to mitigate damage during co-lapping and/or co-polishing. Fill material may be positioned in gaps between the first and second structures to mitigate damage during co-lapping and/or co-polishing.
申请公布号 US2016256979(A1) 申请公布日期 2016.09.08
申请号 US201514714876 申请日期 2015.05.18
申请人 Apple Inc. 发明人 Matsuyuki Naoto;Yi Bin;Qu Dezheng;Manjunathaiah Jairam;Nathanson Scott M.;Ness Trevor J.;Nazzaro David I.;Molina Raul A.
分类号 B24B37/04;B29C70/88;B29C65/50;C03C25/00;B29C70/74 主分类号 B24B37/04
代理机构 代理人
主权项 1. A method for co-finishing surfaces, comprising: bonding a first structure formed of a first material and having a first non-planar surface in an aperture defined in a second structure formed of a second material and having a second planar surface such that there is an offset between the first surface and the second surface; co-lapping the first surface and the second surface to reduce the offset; and co-polishing the first surface and the second surface such that the first surface and the second surface are flush.
地址 Cupertino CA US