发明名称 MASK FOR LASER MACHINING AND ITS MANUFACTURE
摘要 PROBLEM TO BE SOLVED: To provide a mask superior in the shape precision of perforation pattern as well as in the distribution of transmissivity and capable of being manufactured by dry etching. SOLUTION: An intermediate film for protecting a substrate 3 from being etched is formed between the substrate 3 with a characteristic of transmitting a laser beam for machining and a reflection film 2 with a characteristic of reflecting a laser beam. The intermediate film 1 is formed with a material whose etching rate is smaller than that of the substrate in the thickness direction in dry etching and also with a material that transmits a laser beam. The intermediate film 1 prevents etching from reaching the substrate 3 in the case where the reflection film 2 is machined in a desired pattern by dry etching. Consequently, it is capable of reducing the distribution of depth of a etched pattern in the main plane of the substrate.
申请公布号 JPH09225669(A) 申请公布日期 1997.09.02
申请号 JP19960038168 申请日期 1996.02.26
申请人 HITACHI LTD 发明人 AMAMIYA KYOKO;TERABAYASHI TAKAO;SUZUKI KENKICHI
分类号 G03F1/08;B23K26/06;C23F1/00;C23F4/04 主分类号 G03F1/08
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