| 摘要 |
PURPOSE:To directly form a mask high in precision on a glass base plate with out using a intermediate material by irradiating ionized corpuscles through a mask original on the plate to transfer the pattern, and forming discolored parts on the base plate. CONSTITUTION:Electron beams 12 are cast on a target from an electron gun 11, and radiated X-rays 14 are projected through the mask original 18 on the mask glass base plate 19 to transfer its pattern 18a and to form discolored parts 19a in the plate 19 intruded into the inside of the plate 19, having no fear of being damaged or deformed, thus permitting the base plate to be directly exposed to light to form the mask, and accordingly, the mask high in precision to be prepared. |
