| 摘要 |
<p>A positive photoresist composition comprising an admixture of a photosensitizer comprising an ester of a dimer of a 2,3,4-trihydroxyalkylphenone having an alkyl group with from 6 to 10 carbon atoms, wherein the hydroxy groups of the trihydroxyalkylphenone have been esterified with 1,2-naphthoquinone diazide-4-sulfonyl chloride, the photosensitizer being present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; and a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition.</p> |
