| 摘要 |
PURPOSE:To evaluate the distortion of the crystal structure of a fine sample by focusing an electron beam on the sample with a focusing lens system, and forming the electron beam transmitting the sample into an image with an objective lens, and forming a focused electron beam diffraction pattern. CONSTITUTION:An electron beam 2 emitted from an electron beam generator is focused by a focusing lens system 3 in an electron microscope 1 and fed into a portion where the distortion of a sample 4 is to be evaluated. The electron beam transmitting the sample 4 is formed into an image by an objective lens 5. A focused electron beam diffraction pattern is formed in an image extracting device 7, the pattern is stored in an image memory device 8 and inputted to a processing device 9. The focused electron beam diffraction pattern image-processed by the device 9 is displayed on a display device 11, and an approximate electron beam diffraction pattern calculated by the program stored in the device 9 based on the information inputted from an input device 10 is also displayed on the device 11. The distortion of the extremely fine section of the fine sample 4 can be evaluated when the microscope 1 is used. |
