METHOD AND APPARATUS FOR PLASMA-ETCHING,申请号KR19950031331-传众专利搜索

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发明名称	METHOD AND APPARATUS FOR PLASMA-ETCHING
摘要
申请公布号	KR0167064(B1)	申请公布日期	1999.02.01
申请号	KR19950031331	申请日期	1995.09.22
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	MIN, KYUNG-JIN
分类号	H01L21/3065;(IPC1-7):H01L21/306	主分类号	H01L21/3065
代理机构		代理人
主权项
地址

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