发明名称 PRODUCTION OF HIGH-PURITY N-PROTECTED S-PHENYLCYSTEINE
摘要 <p>PROBLEM TO BE SOLVED: To provide a method for efficiently removing contaminating impurities. SOLUTION: This method for producing an N-protected S-phenylcysteine comprises adding an organic solvent selected from aromatic hydrocarbons, organic esters and halogen-based hydrocarbons to an alkaline reactional liquid of S-phenylcycteine having a protecting group introduced into amino group thereof in an aqueous medium, extracting a soluble substance, then separating an aqueous solution layer, regulating the pH of the aqueous solution to an acidic one, adding an organic solvent selected from the aromatic hydrocarbons, organic esters and halogen-based hydrocarbons to the acidic aqueous solution and extracting the resultant N-protected S-phenylcysteine on the side of the solvent.</p>
申请公布号 JPH11100364(A) 申请公布日期 1999.04.13
申请号 JP19970264390 申请日期 1997.09.29
申请人 MITSUI CHEM INC 发明人 KOITO MITSUO;YOSHINO SADAO;FUKUHARA NOBUHIRO
分类号 C07C319/20;C07C323/59;(IPC1-7):C07C323/59 主分类号 C07C319/20
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