发明名称 ALIGNER AND METHOD FOR SUBSTRATE TRANSFER
摘要 PROBLEM TO BE SOLVED: To provide an aligner and a method for transferring substrate wherein movement of a charger RRC at reticle replacement does not cause movement of the center of gravity of a device, and the replacement time of reticle is shortened for high throughput even with increased reticles. SOLUTION: A discordal changer RRC is provided between an exposure table ET and a change table CT, an older reticle C is replaced with a new reticle C on the change table CT during an exposure, the change RRC is, after completion of exposure, moved to upper position and a reticle A is transferred from the exposure table ET into a slot 1 while the reticle C from the change table CT into a slot 3, the changer RRC is rotated by 90 deg.C counterclockwise, the changer RRC is moved to a lower position and a reticle B is transferred from a slot 2 into the exposure table ET while a reticle D from a slot 4 to the change table CT. Since the changer RRC merely rotates, the center of gravity does not move, and a reticle is replaced quickly since only 90 deg.C rotation is made.
申请公布号 JPH11251221(A) 申请公布日期 1999.09.17
申请号 JP19980049615 申请日期 1998.03.02
申请人 NIKON CORP 发明人 WATANABE SATOYUKI;YANAGIHARA MASAMITSU
分类号 H01L21/677;G03F7/20;H01L21/027;(IPC1-7):H01L21/027;H01L21/68 主分类号 H01L21/677
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