SUBSTRATE SUPPORTING PEDESTAL, AND SYSTEM AND METHOD FOR FILM DEPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a substrate supporting pedestal which is used for supporting a substrate in the film deposition chamber of a film deposition system and can support the substrate with certainty without dropping it and with which the area of a part hanging over the surface of the substrate can be decreased and film deposition can be uniformly carried out over the whole surface of the substrate. SOLUTION: The substrate supporting substrate (1A) has a pedestal body (16) having an opening (160) capable of enclosing at least a part of the periphery of the outer periphery of the substrate, and a plurality of claw members (190) provided to the pedestal body 16 toward the inner peripheral side of the opening (160). Each of the claw members (190) is constituted of an arm part stretched from the pedestal body (16) side and a claw part having a nearly V-shaped opening, and the arm part has a rib along its longitudinal direction.