发明名称 PROCESS FOR DETERMINING LOCAL EMISSIVITY PROFILE OF SUPRATHERMAL ELECTRONS
摘要 The invention concerns a process for determining a local emissivity profile of suprathermal electrons coming from an ionized gas ring placed in a toric vessel, with the use of tomographic inversion by means of Bessel functions Jo of order 0 which exploits line-integrated measurements acquired by current real-time Hard-X-Ray diagnostics.
申请公布号 KR20070093400(A) 申请公布日期 2007.09.18
申请号 KR20077014153 申请日期 2007.06.21
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE 发明人 MAZON DIDIER;BARANA OLIVEIRO;PEYSSON YVES
分类号 H05H1/12 主分类号 H05H1/12
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