SHOWERHEAD AND FILM DEPOSITING APPARATUS INCLUDING THE SAME

摘要

A shower head and a thin film deposition apparatus with the same are provided to remove completely the debris of a hole type from a substrate by forming uniformity plasma using a tilted surface of an edge portion of a hole. A shower head(200) includes a plurality of holes capable of spraying a gas. A tilted surface is formed at an edge portion of each hole. The tilted surface is formed like a round type structure. The tilted portion is capable of being composed of one or more linear portions with an angle larger than that of an inner wall of the hole. The shower head is used for a thin film deposition apparatus, wherein the thin film deposition apparatus further includes a chamber for forming a processing space, a substrate support unit for loading a substrate.