发明名称 GAS CONTROL APPARATUS
摘要 A gas control apparatus is provided to supply gas only to an auxiliary orifice by automatically detecting excessive increase of the temperature around a burner and blocking a main orifice. A gas control apparatus includes a body(112), a main orifice(114), an auxiliary orifice(126), a diaphragm(116), a heat detection plate(118), a bimetal disc(120), and a transfer shaft(122). The body is installed in an individual gas pipe for supplying gas to a burner. A gas chamber is formed in the body. The main orifice and the auxiliary orifice guide the gas supplied through the individual gas pipe to the gas chamber. The diaphragm shields the main orifice selectively. The heat detection plate transfers external heat to the inside of the gas control apparatus. The bimetal disc is deformed by the heat transferred by the heat detection plate. The transfer shaft is installed between the bimetal disc and the diaphragm and pushes the diaphragm to one side as the bimetal disc is deformed.
申请公布号 KR100761141(B1) 申请公布日期 2007.09.21
申请号 KR20060098898 申请日期 2006.10.11
申请人 LG ELECTRONICS INC. 发明人 CHO, SEONG SIG
分类号 F24C3/12;F24C3/00 主分类号 F24C3/12
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