发明名称 |
Mask arrangement, optical projection system and method for obtaining grating parameters and absorption properties of a diffractive optical element |
摘要 |
A mask arrangement or an optical projection system includes a diffractive optical element. The diffractive optical element includes grid sections having gratings with defined grating parameters and absorbing elements with defined absorption properties, wherein each grid section corresponds to a respective mask section with mask pattern elements. The diffractive optical element may correct dimension deviations of resist pattern elements obtained from the respective mask pattern elements, wherein the deviations are caused by dimension deviations of the mask pattern elements or by local deviations and defects of the projection system.
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申请公布号 |
US2007287075(A1) |
申请公布日期 |
2007.12.13 |
申请号 |
US20060451618 |
申请日期 |
2006.06.13 |
申请人 |
PFORR RAINER;REICHELT JENS;HENNIG MARIO;MULDERS THOMAS;ZEILER KARSTEN |
发明人 |
PFORR RAINER;REICHELT JENS;HENNIG MARIO;MULDERS THOMAS;ZEILER KARSTEN |
分类号 |
G03B27/42;G03F1/00 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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