| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition capable of forming a transparent membrane having high liquid repellency, and further forming a membrane having excellent developability or pattern forming property. <P>SOLUTION: The photosensitive composition comprises a polymer (A) obtained by polymerizing a specific fluorine-containing siloxane compound as a monomer, a compound (B) having a polymerizable double bond, and a photopolymerization initiator (C). By using an alkali-soluble polymer as the polymer (A), the photosensitive composition has more excellent developability. <P>COPYRIGHT: (C)2008,JPO&INPIT |
