发明名称 Coating apparatus
摘要 <p>In coating with two slits of a coating slit (30) and a recovering slit (32), by optimizing the slit clearance of the coating slit (30) and the recovering slit (32), a coating layer with a very small and even thickness can be obtained. In a coating apparatus (10) in which after a coating liquid is applied to a web (12) to excess through the coating slit (30), a desired amount of coating liquid is applied to the web (12) by scraping off an excess of coating liquid with a recovering slit (32), there is provided a slit clearance adjusting device (15) for adjusting the slit clearance of the recovering slit (32).</p>
申请公布号 EP1346776(B1) 申请公布日期 2009.01.07
申请号 EP20030003670 申请日期 2003.02.18
申请人 FUJIFILM CORPORATION 发明人 MANDAI, TOSHIHIRO;TOMARU, MIKIO;SHIBATA, NORIO
分类号 B05C5/02;B05D1/26;B05C11/04;B05C11/10;B05D3/00;B05D7/00;G11B5/842 主分类号 B05C5/02
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