发明名称 Cylindrical sputtering cathode - esp for cathodic sputtering plant using annular discharge and outer electrodes
摘要 <p>The outer electrodes fully enclose the sputtering zone and within the cylindrical body of the cathode proper a number of supplementary sheet metal plates, in the form of truncated conical surfaces are arranged so that the normals to their surfaces fall on the substrate to be coated and which viewed from that substrate are at least partially overlapped. Significantly higher rate of deposition with improved uniformity.</p>
申请公布号 DE2125936(A1) 申请公布日期 1972.12.07
申请号 DE19712125936 申请日期 1971.05.25
申请人 SIEMENS AG 发明人
分类号 C23C14/35;(IPC1-7):23C15/00 主分类号 C23C14/35
代理机构 代理人
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