发明名称 PELLICLE FOR LITHOGRAPHY
摘要 <p>PROBLEM TO BE SOLVED: To enhance the accuracy of the housing position or the attaching position of a pellicle and to prevent a foreign matter from being generated even when the pellicle is interposed by a handling jig by setting the position of the end of a protection sheet at the outside circumferential surface of a frame. SOLUTION: A pellicle film 1 is made to adhere to one end surface of the frame 2 by using and adhesive agent 5 and the other end surface is provided with an adhesive agent layer 6. Then, the layer 6 is covered with the protection sheet 7. The sheet 7 does not project to the outside of two faced outside circumferential surfaces 11 out of four surfaces 11 of the frame 4 with which the arm of the handling jig used when the pellicle is moved is brought into contact. Then, the end of the sheet 7 is positioned more inside than the outside circumferential surfaces 11. Since one part of the sheet 7 projects to the outside of one outside circumferential surface out of two rest outside circumferential surfaces, the sheet 7 is peeled by seizing the projecting part thereof when the pellicle is attached to an exposure original plate. The sheet 7 does not project to the outside of one rest outside circumferential surface but it is good that it is made to project.</p>
申请公布号 JPH09319071(A) 申请公布日期 1997.12.12
申请号 JP19960157565 申请日期 1996.05.29
申请人 SHIN ETSU CHEM CO LTD 发明人 HAMADA YUICHI;KASHIDA SHU
分类号 G03F1/14;(IPC1-7):G03F1/14 主分类号 G03F1/14
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