发明名称 |
DEPOSITION OF THIN FILM WITH SUPPORT AND PRODUCTION OF X-RAY MASK |
摘要 |
<p>PROBLEM TO BE SOLVED: To deposit a thin film secured to a support and to produce an X-ray mask while protecting them against mechanical damage and eliminating contamination due to acid or alkali. SOLUTION: A substance making a transition to a liquid phase or a solid phase at a temperature lower than the denaturation point of a thin film substance is employed as a basic material 12. A thin film 13 is then deposited thereon to form a laminate 14 which is then brought into tight contact with a support 11 composed of a substance in which phase transition does not take place at a temperature lower than the transition temperature of the basic material 12. Subsequently, it is heat treated at a temperature higher than the transition temperature of the basic material 12 but lower than the denaturation point of the thin film substance to produce a thin film 10 with support. An X-ray absorber is then bonded onto the thin film 10 with support and sputtered to produce an X-ray mask.</p> |
申请公布号 |
JPH09326355(A) |
申请公布日期 |
1997.12.16 |
申请号 |
JP19960163910 |
申请日期 |
1996.06.04 |
申请人 |
HOYA CORP |
发明人 |
MITSUI HIDEAKI;NAGASAWA HIROYUKI;SHIYOUKI TSUTOMU |
分类号 |
G03F1/08;C23C16/27;C23C16/56;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G03F1/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|