发明名称 DEPOSITION OF THIN FILM WITH SUPPORT AND PRODUCTION OF X-RAY MASK
摘要 <p>PROBLEM TO BE SOLVED: To deposit a thin film secured to a support and to produce an X-ray mask while protecting them against mechanical damage and eliminating contamination due to acid or alkali. SOLUTION: A substance making a transition to a liquid phase or a solid phase at a temperature lower than the denaturation point of a thin film substance is employed as a basic material 12. A thin film 13 is then deposited thereon to form a laminate 14 which is then brought into tight contact with a support 11 composed of a substance in which phase transition does not take place at a temperature lower than the transition temperature of the basic material 12. Subsequently, it is heat treated at a temperature higher than the transition temperature of the basic material 12 but lower than the denaturation point of the thin film substance to produce a thin film 10 with support. An X-ray absorber is then bonded onto the thin film 10 with support and sputtered to produce an X-ray mask.</p>
申请公布号 JPH09326355(A) 申请公布日期 1997.12.16
申请号 JP19960163910 申请日期 1996.06.04
申请人 HOYA CORP 发明人 MITSUI HIDEAKI;NAGASAWA HIROYUKI;SHIYOUKI TSUTOMU
分类号 G03F1/08;C23C16/27;C23C16/56;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F1/08
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