| 摘要 |
The invention relates to a method of depositing thin films onto a substrate by the technique of sputtering using laser ablation, the method consisting in sputtering a target (3) by means of a laser beam (7) and in transferring, to the substrate (4), the material of the target in the form of a plasma plume, the method being characterised in that it comprises the following operations: - moving the area of impact of the laser beam on the target in order to sputter successive areas; - selecting part of the plume (17) so as to obtain homogeneous deposition of target material. The invention also relates to a device for the implementation of this process. <IMAGE>
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