| 摘要 |
The second pole layer P2 of a thin film transducer structure is fabricated by using two levels of photoresist to define the pattern of the P2 pole layer. The first photoresist layer is deposited as a thin film and is used to focus an optical projection device that projects the mask pattern onto the photoresist. After etching and curing of the first photoresist, which is disposed above a portion of the first pole piece at the apex of the transducer, a second photoresist layer is deposited over the first photoresist layer and above the insulation deposited over the electrical coil structure. The second photoresist layer is relatively thick and serves to define the frame for printing the P2 pole piece pattern a second time. The data track width defined by the P2 pole piece is more uniform as a result of the improved definition of the frame used for registering the P2 pattern.
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