发明名称 DUMMY WAFER MADE OF VITREOUS CARBON FOR HEAT TREATING SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To provide a dummy water being mounted on a wafer boat in the heat treatment process of semiconductor in which the dummy wafer can be used for a long term by protecting the dummy wafer against abnormal thermal deformation so that it can be reused a large number of times thereby eliminating a troublesome replacing operation. SOLUTION: The circular dummy wafer made of vitreous carbon and mounted on a wafer boat being placed in a heat treatment furnace for semiconductor has curved surface of a specified radius of curvature. Preferably, a relationship h/d=0.1&times;10<-2> &sim;0.5&times;10<-2> is set between the radius (d) of a circular plane defined by the circumferential end part of the dummy wafer and the length (h) of a perpendicular from the center of the dummy water.
申请公布号 JPH09330857(A) 申请公布日期 1997.12.22
申请号 JP19960170582 申请日期 1996.06.10
申请人 TOSHIBA CERAMICS CO LTD 发明人 HAGIWARA HIROTAKA;SOTODANI EIICHI;AMANO MASAMI
分类号 C04B35/52;H01L21/02;H01L21/22 主分类号 C04B35/52
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