发明名称 |
DUMMY WAFER MADE OF VITREOUS CARBON FOR HEAT TREATING SEMICONDUCTOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a dummy water being mounted on a wafer boat in the heat treatment process of semiconductor in which the dummy wafer can be used for a long term by protecting the dummy wafer against abnormal thermal deformation so that it can be reused a large number of times thereby eliminating a troublesome replacing operation. SOLUTION: The circular dummy wafer made of vitreous carbon and mounted on a wafer boat being placed in a heat treatment furnace for semiconductor has curved surface of a specified radius of curvature. Preferably, a relationship h/d=0.1×10<-2> ∼0.5×10<-2> is set between the radius (d) of a circular plane defined by the circumferential end part of the dummy wafer and the length (h) of a perpendicular from the center of the dummy water. |
申请公布号 |
JPH09330857(A) |
申请公布日期 |
1997.12.22 |
申请号 |
JP19960170582 |
申请日期 |
1996.06.10 |
申请人 |
TOSHIBA CERAMICS CO LTD |
发明人 |
HAGIWARA HIROTAKA;SOTODANI EIICHI;AMANO MASAMI |
分类号 |
C04B35/52;H01L21/02;H01L21/22 |
主分类号 |
C04B35/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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