发明名称 FILM SUBSTRATE AND APPARATUS FOR PRODUCING THE SAME
摘要 <p>PURPOSE:To suppress the warpage of the film substrate at the time of curing the substrate by UV rays or heat by using the film substrate contg. a photo- or thermosetting material as the substrate of a liquid crystal display device. CONSTITUTION:The film substrate 5 consists of a substrate formed by thinly stretching the curing resin which is a thermosetting resin or UV curing resin to a film form or a substrate formed by applying such curing resin to a flexible substrate of polyimide, etc., for example, polyimide, PVA, etc., or a substrate formed by stretching a mixture formed by mixing polyimide, PVA, etc., and the curing resin, to a film form. The film substrate 5 prior to formation of moldings, such as color filters 9 or switching elements, of the liquid crystal display device, on the film substrate 5 is wound on a take-up shaft 10 of the diameter as small as possible and after these moldings are formed, the film substrate 5 is taken up on a take-up shaft of the diameter larger than the diameter of the initial take-up shaft.</p>
申请公布号 JPH0659249(A) 申请公布日期 1994.03.04
申请号 JP19920210420 申请日期 1992.08.06
申请人 SEIKO EPSON CORP 发明人 FUJIMORI YUJI
分类号 G02B5/20;G02F1/1333;(IPC1-7):G02F1/133 主分类号 G02B5/20
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