发明名称 |
PRODUCTION OF SILICON CARBIDE SINGLE CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To obtain a silicon carbide single crystal with reduced defects by clogging the micro-pipe defects distributing inside the substrate of silicon carbide single crystal. SOLUTION: A silicon carbide substrate as a raw material, particularly a silicon carbide single crystal substrate 2 and silicon carbide substrates 1a and 1b different in its crystalline form from that of the single crystal substrate 2 are arranged so that it may come into contact with both faces of the single crystal substrate having the micro-tube defects and they are heat-treated in a crucible 6. Thus, the silicon carbide vapor is vaporized and re-crystallized in the microtube defects whereby the defects of micro-pipes are clogged 3.
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申请公布号 |
JP2000044393(A) |
申请公布日期 |
2000.02.15 |
申请号 |
JP19980221099 |
申请日期 |
1998.07.21 |
申请人 |
DENSO CORP;TOYOTA CENTRAL RES & DEV LAB INC |
发明人 |
ONDA SHOICHI;ONODA TAKASHI;OKAMOTO ATSUHITO;SUGIYAMA NAOHIRO |
分类号 |
C30B29/36;(IPC1-7):C30B29/36 |
主分类号 |
C30B29/36 |
代理机构 |
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主权项 |
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地址 |
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