发明名称 SUBSTRATE DRYING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate drying device in which liquid left on a substrate can be removed completely while a degree of cleanness within a drying chamber is being maintained. SOLUTION: A plurality of transporting rollers for use in transporting a substrate are arranged in an evacuation chamber 10 and a liquid draining chamber 20 of which inner sides are continuous from each other. A driving section for the transporting rollers is covered by a driving section cover. An exhaust pipe is connected to a liquid collecting section 11 at the bottom surface of the evacuation chamber 10. An evacuation pipe of the driving section is connected to the bottom surface of the evacuation chamber 10 and an exhaust pipe of the driving section is connected to a rear surface of the evacuation chamber 10 and the pipes are communicated with a space covered by the driving section cover around the driving section. The exhaust pipe and the evacuation pipe at the driving section are connected to a vertical pipe 15 at the rear side of the evacuation chamber 10. An automatic damper is arranged at the upper end of the vertical pipe 15. A ceiling of the liquid draining chamber 20 is formed to be higher than that of the evacuation chamber 10. A fan device 22 is arranged at the upper part of the evacuation chamber 10 and then air knives are arranged at the upper part and the lower part of the transporting passage for the substrate.
申请公布号 JP2000283652(A) 申请公布日期 2000.10.13
申请号 JP19990092682 申请日期 1999.03.31
申请人 SHIBAURA MECHATRONICS CORP 发明人 TOYOSHIMA NORIO;HORI TETSUMASA
分类号 F26B21/00;(IPC1-7):F26B21/00 主分类号 F26B21/00
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