MANUFACTURING APPARATUS AND METHOD OF CHEMICAL-MECHANICAL POLISHING PAD

摘要

An apparatus and a method of manufacturing a chemical/mechanical polishing pad is provided to simplify a manufacturing process by shaping the pad in a disc type and forming a groove on an upper portion of the pad. An apparatus includes a mold unit(100) forming a polishing pad, a base plate(200) supporting the mold unit, a pressing unit(300) applying pressure to the mold unit, and a heat exchanger(400) heating or cooling the mold unit. A groove pattern has a protrusion part, corresponding to the groove, formed on an upper portion of an injection space of the mold. A PET film attached to an upper portion of the groove pattern and a lower portion of the mold, platens engaged to upper and lower portions of the PET film, and plates engaged to upper and lower portions of the platen, and a vacuum platen positioned on the upper portion of the platen.