发明名称 |
Process for Synthesizing Reduced Graphene Oxide on a Substrate from Seedlac |
摘要 |
The present invention relates to synthesizing reduced graphene oxide on the surface of a metal sheet and glass. The invention particularly relates to a process for coating a substrate with reduced graphene oxide using seedlac as a carbon source. As per the process of the current invention, a solution of seedlac is prepared in an alcohol and the substrate is dipped in to the solution for one or more time. The substrate is then dried in air for 1-10 minutes and thereafter, heated to a temperature range of 400 to 1200° C. under controlled atmosphere of Ar/N2/Ar—H2/N2—H2 at a different flow rate ranging from 100 to 500 seem for a period of 10 to 120 minutes. |
申请公布号 |
US2016185604(A1) |
申请公布日期 |
2016.06.30 |
申请号 |
US201414767959 |
申请日期 |
2014.05.08 |
申请人 |
Tata Steel Limited ;Council of Scientific and Industrial Research |
发明人 |
Shyam Kumar Choudhary;Manish Kumar Bhadu;Tapan Kumar Rout;Sumitesh Das;Ranjan Kumar Sahu;Yashabanta Narayan Singhbabu;Ashit Kumar Pramanick;Vikas Chandra Srivastava |
分类号 |
C01B31/04;B05D3/04;C03C17/32;B05D7/14;B05D7/00 |
主分类号 |
C01B31/04 |
代理机构 |
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代理人 |
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主权项 |
1. A process for synthesizing reduced graphene oxide from seedlac on a substrate, the process comprising:
preparing a seedlac solution in a C2-C4 alcohol; dipping the substrate into the seedlac solution one or more times; and heating the substrate in the temperature range of 400° C. to 1200° C. under a controlled atmosphere of Ar/N2/Ar—H2/N2—H2 at the flow rate of 100 to 500 sccm for a period of 10 to 120 minutes. |
地址 |
Jamshedpur IN |