| 摘要 |
Relief images or resist images are produced by a positive-working process, using a solid photosensitive resist layer which is applied to a base and contains a compound possessing two or more aromatic and/or heteroaromatic o-nitrocarbinol ester groups and crosslinking compounds possessing two or more reactive groups which are capable, under the action of heat, of reacting with carboxyl groups to form a covalent chemical bond. To produce the relief images or resist images, the photosensitive resist layer is first exposed imagewise to actinic light, the exposed areas of this layer are then washed out with an aqueous developer, the remaining resist layer is post-exposed uniformly to actinic light and finally the post-exposed resist layer is thermally crosslinked and hardened.
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