发明名称 |
Radiation sensitive resin composition |
摘要 |
A radiation sensitive resin composition which can be suitably used as a negative type resist having a high sensitivity, a high resolution, a high yield of residual film thickness and high thermal resistance, and which comprises (A) an alkali-soluble novolak resin, (B) a phenolic compound having a standard polystyrene-reduced weight average molecular weight of 10,000 or less such as polyvinylphenol, (C) a compound capable of cross-linking the component (A) and/or the component (B) in the presence of an acid, and (D) a radiation sensitive acid generator such as a triazine compound having a halomethyl group.
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申请公布号 |
US5494777(A) |
申请公布日期 |
1996.02.27 |
申请号 |
US19940229677 |
申请日期 |
1994.04.19 |
申请人 |
JAPAN SYNTHETIC RUBBER CO., LTD. |
发明人 |
SHIRAKI, SHINJI;MIYAMOTO, HIDETOSHI;INOUE, MASAAKI;OTA, TOSHIYUKI;YUMOTO, YOSHIJI;MIURA, TAKAO |
分类号 |
G03F7/004;G03F7/038;(IPC1-7):G03C1/492 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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