| 摘要 |
PROBLEM TO BE SOLVED: To prevent the contamination of a thin substrate with the air staying in a recessed section in front of a gate valve, when the substrate is carried to the next process from a process by means of a transfer robot provided with a housing box. SOLUTION: When a thin substrate S is transferred between a transfer chamber 2 which is installed to a treating device 1 and held in an inert gas atmosphere, by using a transfer robot 30 provided with a housing chamber 3 which can house the substrate S in an inert gas atmosphere, the substrate S is carried in and out of the chambers 3 and 2 by opening the gate valves GV1 and GV2 of the chambers 3 and 2 after arranging a connecting chamber 4 between the chambers 3 and 2, evacuating the chamber 4 and, then, introducing an inert gas to the chamber 4. |
