发明名称 DEVICE AND METHOD FOR MODIFYING SURFACE OF CYLINDRICAL BASE MATERIAL
摘要 PROBLEM TO BE SOLVED: To easily form a functional thin film on a base material at a low cost by turning an anode electrode of a roll shape of an atmospheric pressure plasma processing device while supporting a cylindrical base material. SOLUTION: A plasma generating device body 2 comprises an aluminum cathode electrode 3, a fluoro-resin cylindrical body 4 and an anode electrode 5. An outlet 31 to feed the gas is provided in a tip part of the cathode electrode 3, and connected to a high frequency oscillator 7, the anode electrode 5 of a roll shape is grounded, and a cylindrical base material 9 is turned while supported. The film forming gas is associated with the carrier gas, and fed to the plasma generating device body 2 together with the main gas to generate the plasma. The high frequency voltage is applied from the high frequency oscillator 7 between the cathode electrode 3 and the anode electrode, the atmospheric pressure glow discharge plasma is generated to form a functional thin film on the surface of the rotating cylindrical base material 9.
申请公布号 JP2000355772(A) 申请公布日期 2000.12.26
申请号 JP19990166797 申请日期 1999.06.14
申请人 OKURA IND CO LTD 发明人 SUZAKI YOSHIFUMI;SHIKAMA KYOICHI;KOINUMA HIDEOMI;TANAKA OSAMU;KAJITANI TAKAHIRO;TANGE YOSHIHIRO;MATSUDA HIDEAKI
分类号 C08J7/00;C23C16/50;C23C16/505;G03G5/00;G03G5/10;(IPC1-7):C23C16/50 主分类号 C08J7/00
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