| 摘要 |
The present invention is directed to a method and apparatus for intermittently applying particulate material (8) to a substrate. A continuous supply of particulate material (8) is provided from a supply source to a valve (59) having a powder application phase and a recycle phase. The valve (59) is disposed to the powder application phase to allow particulate material (8) to pass therethrough and to fall freely onto at least a Portion of the substrate. The valve (59) is disposed in the recycle phase to prevent dispensing of the particulate material (8) onto the substrate and to retain the particulate material (8) within the valve (59) to be conveyed back to the supply source. |
