发明名称 |
Filmbildende Zusammensetzung, poröser Film und deren Herstellung |
摘要 |
<p>A composition comprising (A) a silanol group-bearing silicone resin comprising 30-100 mol% of T units: R<1>-SiZ3 and among the entire T units, 30-80 mol% of T-2 units containing only one silanol group: R<1>-Si(OH)Z'2 wherein R<1> is a monovalent hydrocarbon group, Z is OH, hydrolyzable group or siloxane residue, at least one Z being a siloxane residue, and Z' is a siloxane residue, and having a number average molecular weight of at least 100, and (B) a polymer resulting from an acrylate and/or methacrylate monomer is applied to a substrate and heated above the decomposition temperature of polymer (B) to form a porous film. The porous film is flat and uniform despite porosity, and has a low permittivity and high mechanical strength. It is best suited as an interlayer insulating layer when used in semiconductor device fabrication.</p> |
申请公布号 |
DE60200719(T2) |
申请公布日期 |
2005.08.04 |
申请号 |
DE2002600719T |
申请日期 |
2002.01.15 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
YAGIHASHI, FUJIO;IWABUCHI, MOTOAKI;YAMAMOTO, AKIRA |
分类号 |
B05D3/02;B05D5/06;B05D7/24;C08F2/44;C08F283/12;C08J5/18;C08L43/04;C08L83/00;C08L83/04;C09D133/06;C09D183/04;H01L21/312;H01L21/316;(IPC1-7):C08L83/04;C08L33/06 |
主分类号 |
B05D3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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