| 摘要 |
<p>A photosensitive resin composition for forming light shielding patterns of a plasma display is provided to easily give the light shielding patterns such as black stripe with high linearity without released materials or residues by comprising particular photo-polymerization initiator having high light sensitivity as well as light shielding material, binder resin and photo-polymeric compound. The photosensitive resin composition comprises: (A) a light shielding material; (B) a binder resin; (C) a photo-polymerization initiator; and (D) a photo-polymeric compound. The photo-polymerization initiator includes at least one selected from compounds represented by a formula(1) with X defined by a formula(2), wherein R3 to R7 are selected from hydrogen, halogen, alkyl group having C1 to C12, phenyl group and phenylsulfanyl group, or defined by a formula(3), wherein R3 to R7 are selected from hydrogen, halogen, alkyl group having C1 to C12 and phenyl group. In the formula(1), R1 is selected from phenyl group, alkyl group having C1 to C20, CN, NO2 and haloalkyl group having C1 to C4, and R2 is selected from acyl group having C2 to C12 and alkenyl group having C4 to C6.</p> |
