| 摘要 |
A continuous flow chemical metering apparatus includes a measuring vessel adapted to hold a column of fluid, a sensor for determining head pressure and a processor to establish calibration data regarding the relationship between head pressure and a height of the column of fluid in the measuring vessel. A valve is closed when the height of the column of fluid in the measuring vessel reaches a predetermined level, so that chemical drawn by the chemical injection device partially empties the measuring vessel. The processor determines flow rate by monitoring signals from the at least one sensor and performing calculations using the calibration data and current data regarding dynamic changes to head pressure.
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