发明名称 Process flow for building MRAM structures
摘要 MRAM structures employ the magnetic properties of layered magnetic and non-magnetic materials to read memory storage logic states. Improvements in switching reliability may be achieved by altering the shape of the layered magnetic stack structure. Forming recessed regions with sloped interior walls in an ILD layer prior to depositing the layered magnetic stack structure produces a significant advantage over the prior art by allowing a CMP process to be used to define the magnetic bit shapes. The sloped interior walls of the recessed regions, which is singular to the present invention, provide a unique formation and shaping of the magnetic stack structure, which may reduce the magnetic coupling effect between magnetic layers of the magnetic stack structure.
申请公布号 US7306954(B2) 申请公布日期 2007.12.11
申请号 US20030637096 申请日期 2003.08.08
申请人 MICRON TECHNOLOGY, INC. 发明人 NEJAD HASAN;DEAK JAMES G.
分类号 H01L21/8244;G11C11/15;H01L27/22;H01L43/08;H01L43/12 主分类号 H01L21/8244
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