发明名称 PHOTOSENSITIVE COMPOUNDS, PHOTOPOLYMERIZABLE COMPOSITIONS INCLUDING THE SAME, AND METHODS OF MAKING AND USING THE SAME
摘要 <p>The present invention is directed to reaction products prepared from at least one Michael addition donor material including two or more active methylene hydrogens; and at least one material capable of reacting with a Michael addition donor, the material having one Michael addition acceptor and at least one functional group selected from the group consisting of hydroxy, hydroxyalkyl, vinyl ether, amino, aminoalkyl, carboxy, carboxyalkyl, cyano, and cyanoalkyl groups; or reaction products prepared from (a) at least one Michael addition donor material comprising at least one Michael Addition donor group selected from the group consisting of cyano functional groups and phosphono functional groups; and (b) at least one material capable of reacting with the at least one Michael addition donor group, the material having at least one Michael addition acceptor, wherein the above reaction products are capable of forming free radicals upon exposure to actinic radiation; as well as compositions, and processes for making and using the same.</p>
申请公布号 WO2009014689(A2) 申请公布日期 2009.01.29
申请号 WO2008US08886 申请日期 2008.07.22
申请人 HENKEL CORPORATION;MESSANA, ANDREW, D.,;JACOBINE, ANTHONY, F.,;NAKOS, STEVEN, T.,;WOODS, JOHN, G.,;SCHALL, JOEL, D.,;GLASER, DAVID, M., 发明人 MESSANA, ANDREW, D.,;JACOBINE, ANTHONY, F.,;NAKOS, STEVEN, T.,;WOODS, JOHN, G.,;SCHALL, JOEL, D.,;GLASER, DAVID, M.,
分类号 C07C69/587;C08F2/50;C08G16/00 主分类号 C07C69/587
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