发明名称 |
EXPOSURE METHOD, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
An exposure method comprises: forming an immersion region (LR) on a substrate (P); exposing the substrate (P) by irradiating the substrate (P) with an exposure light (EL) via a liquid (LQ) of the immersion region (LR); and preventing an integration value of a contact time during which the liquid (LQ) of the immersion region (LR) and a first region (S1 to S37, 101) on the substrate (P) are in contact, from exceeding a predetermined tolerance value. |
申请公布号 |
EP1876637(A4) |
申请公布日期 |
2010.01.27 |
申请号 |
EP20060745861 |
申请日期 |
2006.04.28 |
申请人 |
NIKON CORPORATION |
发明人 |
SHIRAISHI, KENICHI;FUJIWARA, TOMOHARU |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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