发明名称 METHOD AND SYSTEM FOR ANALYZING LAYOUT QUALITY OF MOUNTING PRODUCT
摘要 PROBLEM TO BE SOLVED: To improve quality when developing a new mounting product and to develop the product in a short time simultaneously by analyzing or evaluating the quality of the mounting product while using the layout system of the mounting product, and designing the mounting product so that this analyzed or evaluated quality can satisfy desired quality. SOLUTION: This system is composed of a CAD calculation system 1 and a defect analytic correction system 100. The defect analytic correction system 100 evaluates whether the mounting product designed by the CAD 1 sufficiently satisfies a specification (defect rate) in total performance or quality. Therefore, in optimum value determining processing 110, it is evaluated whether the specification is satisfied at the allowable defect rate or not and a defect rate simulator 105 evaluates whether the specification is satisfied at a total defect rate or not. Then, the total performance or quality and total satisfactory ratc of the mounting product in case of real production are evaluated so as to start mass- production while correcting a layout change or process condition quickly.
申请公布号 JPH10105594(A) 申请公布日期 1998.04.24
申请号 JP19960260882 申请日期 1996.10.01
申请人 HITACHI LTD 发明人 KOJIMA TOSAKU;NOMOTO TAZU;IWAI HIROKI;NAGAMI HAYASHI
分类号 H05K13/00;G06F17/50 主分类号 H05K13/00
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