Process for manufacturing a self-adjusted contact and semiconductor structure.,申请号EP19930115286-传众专利搜索

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发明名称	Process for manufacturing a self-adjusted contact and semiconductor structure.
摘要
申请公布号	EP0591769(A3)	申请公布日期	1994.12.14
申请号	EP19930115286	申请日期	1993.09.22
申请人	SIEMENS AG	发明人	MELZNER HANNO DIPL-PHYS
分类号	H01L21/3205;H01L21/60;H01L21/768;H01L21/8242;H01L27/10;H01L27/108;(IPC1-7):H01L21/90;H01L23/48	主分类号	H01L21/3205
代理机构		代理人
主权项
地址

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