PHOTOSENSITIVE RESIN COMPOSITION AND COATING COMPRISING SAID COMPOSITION
摘要
A photosensitive base resin composition for a photoresist to be used in screen printing comprises a photopolymer, a polyester resin and an amino resin. In particular, the composition comprises 5-30 % of a poly(vinyl alcohol) which has been grafted with stilbazolium, as a photopolymer, 20-80 % alkyd resin and 10-70 % of amino resin (percentages given as solid matter of base composition). The base resin composition according to the invention affords a nontacky layer and has good stability.
申请公布号
WO9734198(A1)
申请公布日期
1997.09.18
申请号
WO1997NL00125
申请日期
1997.03.12
申请人
STORK SCREENS B.V.;HARRIS, STUART, ARTHUR;KESSLER, THEODORUS;KOSTER, ALBERTUS;POUWELS, GERARDUS, FRANCISCUS, JOSEPH
发明人
HARRIS, STUART, ARTHUR;KESSLER, THEODORUS;KOSTER, ALBERTUS;POUWELS, GERARDUS, FRANCISCUS, JOSEPH