| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern which determines a method capable of easily discriminating whether optical image of a wiring pattern is acceptable, when wiring pattern of a semiconductor device is set, and an aperture capable of reducing optical proximity effect. SOLUTION: This method is provided with a step S1 for setting the width or the like of wiring, a step S2 for functionally expressing a mask pattern and the form of an aperture, steps S3, S4 calculating the amplitude distribution of exposure light, a step S5 for calculating the intensity distribution of exposure light on an image surface, steps S6, S7 for calculating the maximum intensity, the minimum intensity and the reference intensity of exposure light, a step S8 for discriminating exposure margin and focusing margin, a step s9 for accumulating the data of image acceptability of an optical image, and a step S10 for displaying a table. A form provided with four aperture parts is set as an aperture form. |
