| 摘要 |
PROBLEM TO BE SOLVED: To prevent intrusion of materials adversely affecting a projection exposure process from a coating development device to a projection aligner, in a coating development aligner of in-line configuration. SOLUTION: An internal pressure of a connection part 3 where a projection aligner 1 is connected to a coating development device 2 is set lower than the interval pressure of the projection aligner 1 and the coating development device 2 while set higher than the pressure of a clean room 8 where a coating development aligner 10 is set. |
