发明名称 PHOTORESIST MASTER DISK OF OPTICAL DISK AND ITS PRODUCTION
摘要 PROBLEM TO BE SOLVED: To obtain pits free of differences in level between a first layer and a second layer by forming grooves and pits varying in depth on the same master disk. SOLUTION: A first photoresist layer 2 is formed on a glass substrate 1 and an intermediate layer 3 consisting of an oxidized film is formed on this first photoresist layer 2. A second photoresist layer 4 is formed on this intermediate layer 3. The grooves 5 and the pits 6 are formed by the first light A to sensitize the second photoresist layer 4 and the second light B to sensitize the first photoresist layer 2 are formed. The first photoresist layer 2 is developed and the intermediate layer 3 is removed. The first photoresist layer 2 is developed, by which the photoresist master disk 7 of an optical disk is produced. The photosensitive sensitivity characteristic of the first photoresist layer 2 is higher than the photosensitive sensitivity characteristic of the second photoresist layer 4.
申请公布号 JPH11203731(A) 申请公布日期 1999.07.30
申请号 JP19980006354 申请日期 1998.01.16
申请人 RICOH CO LTD 发明人 MASUZAWA MASAHIRO
分类号 G03F7/26;G11B7/26;(IPC1-7):G11B7/26 主分类号 G03F7/26
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