RADIATION SENSITIVE RESIN COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having such high sensitivity to radiation typified by far UV or charged particle beams as to require a small quantity of energy for exposure, excellent in resolving power and suitable for use as a chemical amplification type resist having low nano- edge roughness. SOLUTION: The radiation sensitive resin composition contains (A) a radiation sensitive acid generating agent selected from the group comprising compounds of formulae (1) and (2) (where R1 and R2 are each alkyl, fluoroalkyl or aryl which may be substituted by fluorine) and (B) a copolymer of an acetal group-containing styrene derivative typified by p-(1-ethoxyethoxy)styrene and p-hydroxystyrene.